2月9日，龙图光罩涨1.43%，成交额4596.87万元。两融数据显示，当日龙图光罩获融资买入额768.56万 元，融资偿还453.41万元，融资净买入315.15万元。截至2月9日，龙图光罩融资融券余额合计1.79亿 元。 融资方面，龙图光罩当日融资买入768.56万元。当前融资余额1.79亿元，占流通市值的7.16%，融资余 额超过近一年70%分位水平，处于较高位。 融券方面，龙图光罩2月9日融券偿还200.00股，融券卖出0.00股，按当日收盘价计算，卖出金额0.00 元；融券余量0.00股，融券余额0.00元，超过近一年80%分位水平，处于高位。 资料显示，深圳市龙图光罩股份有限公司位于广东省深圳市宝安区新桥街道象山社区新玉路北侧圣佐治 科技工业园4#厂房101，成立日期2010年4月19日，上市日期2024年8月6日，公司主营业务涉及半导体掩 模版的研发、生产和销售。主营业务收入构成为：石英掩模版82.00%，苏打掩模版18.00%。 截至9月30日，龙图光罩股东户数9753.00，较上期增加20.68%；人均流通股3589股，较上期增加 8.64%。2025年1月-9月，龙图光罩实现营业收入1.8 ...

Core Viewpoint - The company emphasizes the existing gaps in domestic high-purity quartz substrates for advanced photomasks, particularly in material purity, defect density, surface flatness, and thermal expansion coefficient stability, which directly affect photomask precision and yield [1] Group 1 - The main indicators of the gap in high-purity quartz substrates are material purity, defect density, surface flatness, and thermal expansion coefficient stability [1] - The root cause of these gaps lies in the accumulation of core technologies related to high-purity synthesis and ultra-precision processing [1] - The company supports breakthroughs in domestic high-end substrate technology and plans to actively and steadily promote the verification and introduction of qualified domestic substrates, provided that related products can continuously meet process stability and yield requirements [1]

证券日报网1月29日讯，龙图光罩在接受调研者提问时表示，公司珠海高端半导体芯片掩模版制造基地 于2025年上半年顺利投产，目前处于产能爬坡关键期。核心产品方面，KrF-PSM和ArF-PSM陆续送往部 分客户进行测试验证，其中90nm节点产品已成功完成从研发到量产的跨越，65nm产品已开始送样验 证，已完成40nm生产设备布局。后续将加速珠海工厂产能释放，重点提升高端产品供给能力，匹配下 游国产替代需求。 ...

Core Viewpoint - Longtu Photomask has outlined its certification process, which typically takes 6-12 months or longer, depending on the complexity of the manufacturing process [1] Group 1: Certification Process - The certification process includes several stages: signing NDA agreements, evaluating information security systems, assessing manufacturing capabilities and precision indicators, verifying process and measurement method compatibility, confirming data processing, evaluating samples, and conducting wafer testing [1] - The higher the manufacturing process level, the stricter and longer the certification period [1] Group 2: Product Development Status - Longtu Photomask has successfully transitioned its 90nm products from research and development to mass production [1] - The 65nm products are currently in the customer validation phase [1]

Core Viewpoint - Longtu Photomask is advancing its Phase II project in Zhuhai as planned, which is a strategic move to enhance high-end processing capabilities and expand production capacity in emerging application fields [1] Group 1: Project Development - The main factory of the Zhuhai Phase II project is scheduled to be completed by September 2025 [1] - This project aims to supplement production capacity in high-end processing and emerging application areas [1] Group 2: Financial Strategy - The company currently maintains a low debt-to-asset ratio [1] - Future funding for the project will be considered through debt and equity financing, with specific plans to be made based on market conditions, regulatory policies, and the company's financial status [1] - The company emphasizes strict adherence to information disclosure obligations [1]

证券日报网1月29日讯 ，龙图光罩在接受调研者提问时表示，PSM（相移掩模版）与普通BIM（二元掩 模版）的核心区别在于其提升光刻分辨率的技术原理。BIM仅通过透光（亮区）与不透光（暗区）的二 元结构来转移图形，其物理极限在相对高端的制程中会导致图形边缘光学干扰，影响精度。而PSM通过 在相邻透光区域引入180度的相位差，利用光的干涉效应使中间暗区的光强抵消得更彻底，从而显著提 升成像的对比度和分辨率，尤其适用于线宽更小、密度更高的高端芯片制造。因此，PSM是支撑90nm 及以下更先进制程的关键技术，其设计和制造复杂度远高于BIM。公司在此领域已具备成熟的技术积累 和量产能力，能够满足客户对高端节点的需求。 （编辑 王雪儿） ...

格隆汇1月29日丨龙图光罩(688721.SH)近日接受特定对象调研时表示，全球半导体掩模版市场中，日本 凸版、美国Photronics、日本 DNP 三家，合计占据超过 80%以上的份额。公司作为国内独立第三方厂 商，聚焦半导体掩模版领域，目前主力产品覆盖 130nm 及以上制程，核心应用于功率半导体、模拟 IC 领域，主要优势在于响应速度快、服务能力强；差距主要体现在先进制程(28nm及以下)研发与量产能 力，以及全球客户资源布局上，海外头部厂商已实现 EUV 掩模版量产，技术水平上仍存在一定的差 距。 ...

格隆汇1月29日丨龙图光罩(688721.SH)近日接受特定对象调研时表示，公司珠海高端半导体芯片掩模版 制造基地于2025 年上半年顺利投产，目前处于产能爬坡关键期。核心产品方面，KrF-PSM 和 ArF-PSM 陆续送往部分客户进行测试验证，其中 90nm 节点产品已成功完成从研发到量产的跨越，65nm 产品已 开始送样验证，已完成40nm 生产设备布局。后续将加速珠海工厂产能释放，重点提升高端产品供给能 力，匹配下游国产替代需求。 ...

Core Viewpoint - Longtu Photomask (688721.SH) is set to commence production at its high-end semiconductor photomask manufacturing base in Zhuhai in the first half of 2025, currently in a critical capacity ramp-up phase [1] Group 1: Production and Capacity - The company is focusing on ramping up production capacity at its Zhuhai facility, with an emphasis on enhancing the supply capability of high-end products to meet domestic substitution demands [1] - Core products, including KrF-PSM and ArF-PSM, are being sent to select customers for testing and validation [1] Group 2: Product Development - The 90nm node product has successfully transitioned from research and development to mass production [1] - The 65nm product has begun sample validation, and the layout for 40nm production equipment has been completed [1]

格隆汇1月29日丨龙图光罩(688721.SH)近日接受特定对象调研时表示，认证流程主要包括签订 NDA 协 议、信息安全体系评估、制版能力及精度指标考察、工艺与测量方式匹配验证、数据处理确认、样品评 估及流片测试等环节。整体认证周期通常 6-12 个月甚至更长，制程等级越高，认证越严格、周期越 长。目前公司 90nm 产品已成功完成从研发到量产的跨越，65nm 产品处于客户验证阶段。 ...